Anodic Composite Nanostructure: Formation, Morphology, Optical and Photoluminescent Properties

Two-layer Al/Nb (1000/200 nm) was deposited by sputtering using a DC magnetron method on Si wafers. The anodizing in 0.2 M oxalic solution at 53 V, re-anodized the 0.5 boric acid potentiodynamic mode increase of potential until 400 V. For forming anodic composite nanostructure, porous aluminum oxide partially removed 50 % aqueous phosphoric 50°C for 1200 s. morphology, photoluminescence, and optical reflection an nanostructure were investigated. showed effective wavelength range from 540 to 1000 nm, maximum reflective efficiency observed 850 52 reflectance occurs. photoluminescence 453 nm.